Abstract Submission Guidelines
Please review the steps below before entering the online abstract submission site.
Awards & Travel Grants: Both ALD and ALE will recognize student achievement with awards for the best student posters and/or talks. There are also professional awards – See Awards Page. AVS will also be offering some limited travel grants to Students and Postdocs. You may apply during the conference registration process.
Step 1
Before signing up or logging into the online system (in Step 5), please review all of the following steps to ensure you have the information needed to complete the abstract submission process.
Please Note the Following Requirements Prior to Submission:
- If you are planning to submit multiple abstracts, presenters are limited to one oral and one poster presentation. One submission must be to an oral session and one to a poster session. Must be two DIFFERENT abstracts – not the same abstract submitted as both an oral and a poster
- All ALD/ALE oral presentations, including the question and answer period and any discussions, will be audio recorded and synchronized with your PowerPoint presentation file and compiled into conference proceedings accessible to all attendees after the meeting. The conference proceedings will also include PDF files of the poster presentations. Participation in the conference proceedings is mandatory.
- You will need to agree to the copyright agreement
Step 2
You will be asked to select your topic. The list will be similar to the main topics listed below.
Step 3
Fill out the abstract content and author details in the system (abstract 2,700 characters max. including grammar and spacing; you may also submit a supplemental 1 page PDF file containing any graphs, charts or pictures you wish to include)
Step 4
Accept the copyright agreement. If you have questions e-mail della@avs.org.
STEP 5
Opens: November 17, 2026
Due: February 4, 2027
Author Notification
Acknowledgment that your abstract has been submitted will follow by e-mail shortly after submission. Notifications regarding acceptances will be sent by e-mail by March 16, 2027.
Tentative Topics
ALD Applications
- AA1: Energy Conversion: Catalysis, Fuel Cells, Batteries and Solar Energy
- AA2: Logic/Transistor/FEOL
- AA3: Memory/Capacitor/BEOL-DRAM/NAND
- AA4: EUV/Patterning/PR
- AA5: Optoelectronics and Photonics
- AA6: Biological and Pharmaceutical Applications and Coatings
- AA7: Novel ALD Applications: Beyond Semiconductor
- AA8: ALD Applications Poster Session
ALD Fundamentals: Chemistry, Growth and Character
- AF1: Precursor Design and Development
- AF2: Process Modeling: AI/ML/Ab Initio/DFT Modeling of Reaction Mechanisms and Precursors
- AF3: Advancements in Metrology: In-situ and Ex-situ Characterization of ALD Films
- AF4: Plasma Enhanced ALD: Materials Synthesis and Role of Plasma Diagnostics in Materials Development
- AF5: Powder and Extreme Surface Area ALD and Solution ALD
- AF6: ALD Process Development, and Equipment
- AF7: Other Advanced Growth Processes: Epitaxy, Co-dosing, Etc.
- AF8: ALD Fundamentals Poster Session
ALD For Manufacturing
- AM1: Large Scale Equipment Design, Process Control, and Precursor Delivery
- AM2: Spatial, Roll-2-Roll and Fast ALD
- AM3: Process Analysis and Control: Metrology, AI/ML for Manufacturing and Digital Twins
- AM4: ALD for Manufacturing Poster Session
Area Selective Atomic Layer Deposition
- AS1: Selective ALD by Area-Activation
- AS2: Selective ALD by Area-Deactivation
- AS3: Emerging Applications in ASD
- AS4: Area Selective ALD Poster Session
Emerging Materials and Processes
- EM1: Molecular Layer Deposition and Hybrid Materials
- EM2: Vapor Phase Infiltration
- EM3: Metal-Organic Frameworks (MOFs)
- EM4: Atomic Layer Annealing
- EM5: Next Generation Semiconductor Materials: AlScN, GaN, BTO, Ga2O3, Novel Metals, Etc.
- EM6: Nanoscale Materials: 2D, Nanoparticles, Nanotubes, and Nanowires
- EM7: Advances in Supercycle Processes for Complex Materials: Doping, Ternary/Quaternary Materials, Nanolaminates, Etc.
- EM8: Energy Enhanced ALD: Beyond Plasma Processes
- EM9: Emerging Materials and Processes Poster Session
Atomic Layer Etching Workshop
- ALE1: Plasma and/or Energy-Enhanced ALE
- ALE2: Gas-phase and/or Thermal ALE
- ALE3: Modelling (Including AI)
- ALE4: Cryo-ALE
- ALE5: Integration of ALE and ALD (Hybrid Methods, ASD …)
- ALE6: Metrology, Diagnostics and ALE Hardware (Including Biasing)
- ALE7: Applications of ALE (Photonics, Quantum, 2D Materials and III-V Materials …)
- ALE9: Materials Selective ALE (Defect Reduction …)
- ALE9: Atomic Layer Surface Engineering (Cleaning, Low Damage …)
- ALE10: New and Emerging Chemistries (Quasi ALE, Dry and Wet ALE …)
- ALE11: Atomic Layer Etching Poster Session